Plasma-enhanced chemical vapour-deposited silicon nitride films; The effect of annealing on optical properties and etch rates

Solar Energy Materials and Solar Cells

Volumn 92, Issue 9, 2008, Pages 1091-1098

  Wright, Daniel N ^a   Marstein, Erik S ^a   Rognmo, Atle ^b   Holt, Arve ^a  

^a INSTITUTE FOR ENERGY TECHNOLOGY   (Norway)

^b NORWEGIAN DEFENCE RESEARCH ESTABLISHMENT FFI   (Norway)

Author keywords

Annealing; Etch rate; Optical properties; PECVD; Silicon nitride

Indexed keywords

ANNEALING; CONCENTRATION (PROCESS); ETCHING; SILICON NITRIDE;

ETCH RATE; SILANE-TO-TOTAL GAS RATIO;

METALLIC FILMS;

EID: 45049085129     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.03.013     Document Type: Article

References (32)

1. Sopori B. J. Electron. Mater. (2003) 1034
2. x:H antireflection coatings for silicon solar cells, in: Conference Record of the Thirty-First IEEE Photovoltaic Specialist Conference, IEEE Cat. No. 05CH37608, 2005.
3. Santana G., and Morales-Acevedo A. Sol. Energy Mater. Sol. Cells (2000) 135
4. Bouhafs D., et al. Sol. Energy Mater. Sol. Cells 52 1-2 (1998) 79
5. y antireflection coatings, in: 21st European Photovoltaic Energy Conference and Exhibition, Dresden, Germany, 2006.
6. D.N. Wright, E.S. Marstein, A. Holt, Double layer anti-reflective coatings for silicon solar cells, in: Conference Record of the Thirty-First IEEE Photovoltaic Specialist Conference, IEEE Cat. No. 05CH37608, 2005.
7. Aspnes D.E., and Theeten J.B. Phys. Rev. B 20 8 (1979) 3292
8. Jellison G., et al. Thin Solid Films (1998) 193
9. Jellison G., and Modine F. Appl. Phys. Lett. (1996) 371
10. Jellison G.E., et al. Thin Solid Films 377 (2000) 68
11. Ay F., and Aydinli A. Opt. Mater. (2004) 33
12. Verlaan V., et al. Phys. Rev. B 73 19 (2006) 8
13. Lipinski M., et al. Opto-Electron. Rev. 12 1 (2004) 41
14. Bustarret E., et al. Phys. Rev. B (1988) 8171
15. Goodman A.L., Favors R.N., and Larsen J.W. Energy Fuels 20 6 (2006) 2537
16. Naiman M.L., et al. J. Electrochem. Soc. 131 3 (1984) 637
17. Shimura F., Tsuya H., and Kawamura T. Appl. Phys. Lett. 37 5 (1980) 483
18. Lanford W., and Rand M. J. Appl. Phys. (1978) 2473
19. Peercy P.S., et al. J. Electron. Mater. 8 1 (1979) 11
20. Hasegawa S., et al. Phys. Rev. B 48 8 (1993) 5315
21. Mackel H., and Ludemann R. J. Appl. Phys. (2002) 2602
22. Handbook of Optical Constants of Solids. Handbook of Optical Constants of Solids, E.D. Palik (Ed.), 1985, pp. xviii+804.
23. Smith D.L., et al. J. Electrochem. Soc. 137 2 (1990) 614
24. Robertson J., and Powell M.J. Appl. Phys. Lett. 44 4 (1984) 415
25. Philipp H.R. J. Electrochem. Soc. 120 2 (1973) 295
26. Hasegawa S., Inokuma T., and Kurata Y. J. Non-Cryst. Solids 187 (1995) 278
27. Robertson J. Philos. Mag. B-Phys. Condens. Matter Stat. Mech. Electron. Opt. Magn. Properties (1994) 307
28. Lee J.W., et al. J. Phys. Chem. Solids 56 2 (1994) 293
29. A.J.M. van Erven, et al., Effects of different firing profiles on layer characteristics and passivation properties of industrial ETP deposited silicon nitride films, in: 19th European Photovoltaic Solar Energy Conference, Paris, France, 2004.
30. Hong J., et al. J. Vac. Sci. Technol. B 21 5 (2003) 2123
31. Knotter D.M., and Denteneer T.J.J. J. Electrochem. Soc. 148 3 (2001) F43
32. D.N. Wright, E.S. Marstein, A. Holt, Assessing the potential of realistic double layer anti-reflective coatings for silicon solar cells, 2007.