Substrate selective patterning on lithography defined gold on silica: Effect of end-group functionality on intermolecular layer formation

Surface Science

Volumn 602, Issue 12, 2008, Pages 2121-2127

  Bergkvist, Magnus ^a   Niamsiri, Nuttawee ^b   Strickland, Aaron D ^c   Batt, Carl A ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b MAHIDOL UNIVERSITY   (Thailand)

^c Department of Obstetrics Gynecology   (United States)

Author keywords

Alkanethiol; Chemical patterning; Nanofabrication; Self assembled monolayer; Silane; Surface derivatization

Indexed keywords

INFRARED SPECTROSCOPY; LITHOGRAPHY; NANOBIOTECHNOLOGY; SILICA; SUBSTRATES;

INTERMOLECULAR LAYER FORMATION; SUBSTRATE SELECTIVE PATTERNING;

GOLD COMPOUNDS;

EID: 44949146059     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.04.027     Document Type: Article

References (31)

1. Nuzzo R.G., and Allara D.L. J. Am. Chem. Soc. 105 (1983) 4481
2. Maoz R., and Sagiv J. J. Colloid Interf. Sci. 100 (1984) 465
3. Gooding J.J., Mearns F., Yang W., and Liu J. Electroanalysis 15 (2003) 81
4. Li X.-M., Huskens J., and Reinhoudt D.N. J. Mater. Chem. 14 (2004) 2954
5. Faucheux N., Schweiss R., Lutzow K., Werner C., and Groth T. Biomaterials 25 (2004) 2721
6. Kannan B., Kulkarni R.P., Satyanarayana S., Castelino K., and Majumdar A. J. Vac. Sci. Technol. B 23 (2005) 1364
7. Baralia G.G., Pallandre A., Nysten B., and Jonas A.M. Nanotechnology 17 (2006) 1160
8. Ilic B., and Craighead H.G. Biomed. Microdev. 2 (2000) 317
9. Christman K.L., Enriquez-Rios V.D., and Maynard H.D. Soft Mat. 2 (2006) 239
10. Xia Y., and Whitesides G.M. Angew. Chem. Int. Edit. Engl. 37 (1998) 550
11. Harant A.W., Whipple S.G., Douglas K., and Bowman C.N. J. Vac. Sci. Technol. B 23 (2005) 354
12. Harnett C.K., Satyalakshmi K.M., and Craighead H.G. Langmuir 17 (2001) 178
13. Laibinis P.E., Hickman J.J., Wrighton M.S., and Whitesides G.M. Science 245 (1989) 845
14. Lussi J.W., Michel R., Reviakine I., Falconnet D., Goessl A., Csucs G., Hubbell J.A., and Textor M. Prog. Surf. Sci. 76 (2004) 55
15. Michel R., Reviakine I., Sutherland D., Fokas C., Csucs G., Danuser G., Spencer N.D., and Textor M. Langmuir 18 (2002) 8580
16. Burdinski D., Saalmink M., van den Berg J.P.W.G., and van der Marel C. Angew. Chem. Int. Edit. Engl. 45 (2006) 4355
17. Hickman J.J., Laibinis P.E., Auerbach D.I., Zou C., Gardner T.J., Whitesides G.M., and Wrighton M.S. Langmuir 8 (1992) 357
18. Boozer C., Yu Q., Chen S., Lee C.-Y., Homola J., Yee S.S., and Jiang S. Sensor. Actuat. B: Chem. 90 (2003) 22
19. Papra A., Gadegaard N., and Larsen N.B. Langmuir 17 (2001) 1457
20. Finklea H.O., Robinson L.R., Blackburn A., Richter B., Allara D., and Bright T. Langmuir 2 (1986) 239
21. Berron B., and Jennings G.K. Langmuir 22 (2006) 7235
22. Arnold R., Azzam W., Terfort A., and Woll C. Langmuir 18 (2002) 3980
23. Wang H., Chen S., Li L., and Jiang S. Langmuir 21 (2005) 2633
24. Laibinis P.E., Bain C.D., Nuzzo R.G., and Whitesides G.M. J. Phys. Chem. 99 (1995) 7663
25. Kurth D.G., and Bein T. Langmuir 11 (1995) 3061
26. Chechik V., Crooks R.M., and Stirling C.J.M. Adv. Mater. 12 (2000) 1161
27. Haneda R., and Aramaki K. J. Electrochem. Soc. 145 (1998) 1856
28. Tillman N., Ulman A., and Penner T.L. Langmuir 5 (1989) 101
29. Kurth D.G., and Bein T. Langmuir 9 (1993) 2965
30. Kurth D.G., and Bein T. Angew. Chem. Int. Edit. Engl. 31 (1992) 336
31. Maoz R., Sagiv J., Degenhardt D., Mohwald H., and Quint P. Supramol. Sci. 2 (1995) 9