Spatial evolution of an ion beam created by a geometrically expanding low-pressure argon plasma

Applied Physics Letters

Volumn 92, Issue 22, 2008, Pages

  Corr, C S ^a   Boswell, R W ^a   Charles, C ^a   Zanger, J ^b  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b GERMAN AEROSPACE CENTER DLR   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BEAM PLASMA INTERACTIONS; CHARGED PARTICLES; DIFFUSION; ELECTRONS; INDUCTIVELY COUPLED PLASMA; INERT GASES; ION BEAMS; ION BOMBARDMENT; IONS; PHOTORESISTS; PLASMAS; PRESSURE; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTOR DOPING; SIZE DISTRIBUTION;

AMERICAN INSTITUTE OF PHYSICS (AIP); ARGON PLASMAS; BEAM DENSITY; CONVEX SHAPES; COUPLED PLASMAS; DIFFUSION CHAMBERS; LOW PRESSURE (LP); PLASMA EXPANSION; RADIAL DISTRIBUTIONS; RETARDING FIELD; SMALL DIAMETER; SOURCE REGIONS; SPATIAL DISTRIBUTION OF; SPATIAL EVOLUTION;

PLASMA (HUMAN);

EID: 44849132562     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2938720     Document Type: Article

References (21)

1. C. Charles and R. W. Boswell, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1557319 82, 1356 (2003).
2. C. Charles, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/16/4/R01 16, R1 (2007).
3. W. M. Manheimer and R. Fernsler, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 10.1109/27.912945 29, 75 (2001).
4. N. Plihon, C. S. Corr, and P. Chabert, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1869533 86, 091501 (2005).
5. P. Chabert, A. J. Lichtenberg, and M. A. Lieberman, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2769989 14, 093502 (2007).
6. N. Plihon, P. Chabert, and C. S. Corr, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2424429 14, 013506 (2007).
7. K. P. Shamrai, Y. V. Virko, V. F. Virko, and A. I. Yakimeno, Proceedings of the 42nd AIAA, 2006 (unpublished), p. 2006/4845.
8. A. Dunaevsky, Y. Raitses, and N. J. Fisch, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2214127 88, 251502 (2006).
9. C. S. Corr, J. Zanger, R. W. Boswell, and C. Charles, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2823575 91, 241501 (2007).
10. A. Aanesland and C. Charles, Phys. Scr., T PHSTER 0281-1847 122, 023306 (2005).
11. N. Plihon, C. Corr, P. Chabert, and J. L. Raimbault, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1947387 98, 023306 (2005).
12. P. Chabert, N. Plihon, C. S. Corr, J. L. Raimbault, and A. J. Lichtenberg, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2345353 13, 093504 (2006).
13. A. Fruchtman, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.96. 065002 96, 065002 (2005).
14. M. D. West, C. Charles, and R. W. Boswell, J. Propul. Power JPPOEL 0748-4658 10.2514/1.31414 24, 134 (2007).
15. C. Charles, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 10.1109/TPS.2005. 844958 33, 336 (2005).
16. F. N. Gesto, B. D. Blackwell, C. Charles, and R. W. Boswell, J. Propul. Power JPPOEL 0748-4658 10.2514/1.13914 22, 24 (2006).
17. K. Takahashi, C. Charles, R. W. Boswell, T. Kaneko, and R. Hatakeyama, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2803763 14, 114503 (2007).
18. C. Charles, A. W. Degeling, T. Sheridan, J. H. Harris, M. A. Lieberman, and R. W. Boswell, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.1322557 7, 5232 (2000).
19. K. T. A. L. Burn, W. J. Goedheer, and D. C. Schram, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1390309 90, 2162 (2001).
20. C. Charles, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.578283 11, 157 (1993).
21. A. Barkan and R. L. Merlino, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.871159 2, 3261 (1995).