Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers

IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006

Volumn , Issue , 2006, Pages 84-85

  Koshiishi, M ^a   Ezoe, Y ^a   Mita, M ^a   Mitsuda, K ^a   Takano, T ^b   Maeda, R ^b   Ishisaki, Y ^c  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; SILICON WAFERS; WET ETCHING;

ANISOTROPIC WET ETCHING; X-RAY MIRRORS;

MEMS;

EID: 41549156105     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. Ezoe et al. Proc. SPIE, 5900, 329, 2005
2. Ezoe et al. Proc. SPIE, in press, 2006