Structural characterization of Ge nanocrystals in silica amorphised by ion irradiation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 12-13, 2008, Pages 3153-3157

  Araujo, L L ^a   Giulian, R ^a   Johannessen, B ^a   Llewellyn, D J ^a   Kluth, P ^a   Azevedo, G de M ^b   Cookson, D J ^c   Ridgway, M C ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b LABORATÓRIO NACIONAL DE LUZ SÍNCROTRON   (Brazil)

^c AUSTRALIAN SYNCHROTRON   (Australia)

Author keywords

Amorphisation; EXAFS; Ge; Ion implantation; Irradiation; Nanocrystals; SAXS; TEM

Indexed keywords

AMORPHIZATION; EXTENDED X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; GERMANIUM; ION BOMBARDMENT; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

DEPTH DISTRIBUTIONS; STRUCTURAL DISORDER;

NANOCRYSTALS;

EID: 44649141896     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.03.175     Document Type: Article

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