X-ray photoelectron spectroscopic study of surface modification of low-k organic materials by plasma treatment

Surface and Interface Analysis

Volumn 36, Issue 8, 2004, Pages 677-680

  Uchida, Y ^a   Fukuda, T ^a   Yanazawa, H ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Adhesion; Low k dielectric; Organic polymer; Tantalum; XPS

Indexed keywords

CAPACITIVELY COUPLED PLASMA (CCP); LOW-K DIELECTRICS; PLASMA TREATMENT; PLASMA-INDUCED DAMAGE;

ADHESION; CHEMICAL BONDS; MAGNETRON SPUTTERING; ORGANIC POLYMERS; OXIDATION; SURFACE TREATMENT; TANTALUM; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC MATERIALS;

EID: 4444300943     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1734     Document Type: Conference Paper

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