A two-step etching method to fabricate nanopores in silicon

Microsystem Technologies

Volumn 14, Issue 7, 2008, Pages 925-929

  Wang, Gou Jen ^a   Chen, Wei Zheng ^a   Chang, Kang J ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b CALIFORNIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; SILICON; SILICON WAFERS; WET ETCHING;

ELECTROCHEMICAL SYSTEM; ION DIFFUSION CURRENT; TRACK-ETCHING;

NANOPORES;

EID: 44249121737     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0481-3     Document Type: Conference Paper

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