Improvements to the alignment process in a commercial vector scan electron beam lithography tool

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 761-763

  Docherty, K E ^a   Thoms, S ^a   Dobson, P ^a   Weaver, J M R ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

Alignment; Correlation; Electron beam lithography; Penrose tilings

Indexed keywords

CORRELATION METHODS; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; FOURIER ANALYSIS; FOURIER TRANSFORMS;

ALIGNMENT PROCESS; COMMERCIAL VECTOR SCAN;

PATTERN RECOGNITION;

EID: 44149127005     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.081     Document Type: Article

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