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Volumn 40, Issue 5, 2008, Pages 931-934

Nanostructuring at the surface of low-energy lead-implanted silicon by electron beam annealing

Author keywords

Electron beam annealing; Ion implantation; Lead; Nanostructures; Silicon

Indexed keywords

ANNEALING; ELECTRON BEAMS; ION IMPLANTATION; LEAD COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS;

ELECTRON BEAM ANNEALING; LEAD NANOSTRUCTURES; LOW-ENERGY LEAD ION IMPLANTATION;

NANOSTRUCTURED MATERIALS;

EID: 44149105384 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.2805 Document Type: Article

Times cited : (6)

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