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Volumn 266, Issue 8, 2008, Pages 1553-1557

Sub-surface retention of Pb atoms in silicon after low-energy ion implantation and electron beam annealing

Author keywords

Kinetic theory; Lead ion implantation; Out diffusion; Surface nanostructuring

Indexed keywords

ELECTRON BEAMS; EVAPORATION; KINETIC THEORY; LEAD; TEMPERATURE DISTRIBUTION;

EID: 43149112049     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.01.044     Document Type: Article
Times cited : (7)

References (20)
  • 11
    • 43149120948 scopus 로고    scopus 로고
    • Ion beam physics at Institute of Geological & Nuclear Science (GNS)
    • Markwitz A., and Kennedy J. Ion beam physics at Institute of Geological & Nuclear Science (GNS). New Zeal. Sci. Rev. 62 (2005) 129
    • (2005) New Zeal. Sci. Rev. , vol.62 , pp. 129
    • Markwitz, A.1    Kennedy, J.2
  • 13
    • 0003419936 scopus 로고
    • Tesmer J.R., and Nastasi M. (Eds), Materials Research Society, USA
    • In: Tesmer J.R., and Nastasi M. (Eds). Handbook of Modern Ion Beam Materials Analysis (1995), Materials Research Society, USA
    • (1995) Handbook of Modern Ion Beam Materials Analysis
  • 18
    • 43149121184 scopus 로고    scopus 로고
    • D.R. Lide, (Ed.), CRC Handbook of Chemistry and Physics, 82nd ed., 2001-2002, p. 4.
    • D.R. Lide, (Ed.), CRC Handbook of Chemistry and Physics, 82nd ed., 2001-2002, p. 4.
  • 19
    • 43149094749 scopus 로고    scopus 로고
    • A. Markwitz, P. Davy, J. Kennedy, H. Baumann, Surf. Interface Anal., doi:10.1002/sia.2805 .
    • A. Markwitz, P. Davy, J. Kennedy, H. Baumann, Surf. Interface Anal., doi:10.1002/sia.2805 .
  • 20
    • 43149099075 scopus 로고    scopus 로고
    • .
    • .


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.