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Volumn 266, Issue 8, 2008, Pages 1553-1557
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Sub-surface retention of Pb atoms in silicon after low-energy ion implantation and electron beam annealing
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Author keywords
Kinetic theory; Lead ion implantation; Out diffusion; Surface nanostructuring
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Indexed keywords
ELECTRON BEAMS;
EVAPORATION;
KINETIC THEORY;
LEAD;
TEMPERATURE DISTRIBUTION;
ELECTRON BEAM ANNEALING;
LEAD ION IMPLANTATION;
ROOM TEMPERATURE;
SURFACE NANOSTRUCTURING;
ION IMPLANTATION;
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EID: 43149112049
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2008.01.044 Document Type: Article |
Times cited : (7)
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References (20)
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