The UV-nanoimprint lithography equipment with multi-head imprinting unit for sub-50 nm half-pitch patterns

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 963-966

  Lee, JaeJong ^a   Choi, KeeBong ^a   Kim, GeeHong ^a   Lee, SeungWoo ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

Compliant mechanism; Multi head unit; Nanoimprinting; Nanoimprinting lithography; Overlay and alignment

Indexed keywords

MICROPROCESSOR CHIPS; QUARTZ; ULTRAVIOLET RADIATION;

COMPLIANT MECHANISM; IMPRINTING UNIT; MULTI HEAD UNIT; NANOIMPRINTING TOOLS;

NANOIMPRINT LITHOGRAPHY;

CHIPS; LITHOGRAPHY; QUARTZ; ULTRAVIOLET RADIATION;

EID: 34247558627     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.079     Document Type: Article

References (5)

1. Chou S.Y., and Krauss P.R. Microelectronic Engineering 35 (1997) 237
2. Choi B.J., Sreenivasan S.V., Johnson S., Colburn M., and Wilson C.G. Precision Engineering 25 (2001) 192
3. Choi K.B. KSME International Journal 17 4 (2003) 528
4. Alkaisi M.M., Jayatissa W., and Konijn M. Current Applied Physics 4 (2004)
5. Lee J.J., Choi K.B., and Kim G.H. Current Applied Physics (2006) 1101