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Science in China, Series F: Information Sciences

Volumn 51, Issue 6, 2008, Pages 807-818

A glance of technology efforts for design-for-manufacturing in nano-scale CMOS processes

(1) Cheng, YuHua a

a PEKING UNIVERSITY (China)

Author keywords

CMOS design technology platform; Design for manufacturing (DFM); Design for yield; IC design methodology; Nano CMOS IC design

Indexed keywords

EID: 44149095261 PISSN: 10092757 EISSN: 18622836 Source Type: Journal
DOI: 10.1007/s11432-008-0054-9 Document Type: Article

Times cited : (7)

References (9)

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2
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3
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4
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5
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- DFM reality in sub-nanometer IC design
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6
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- Proactive design for manufacturing (DFM) for nanometer SoC designs
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7
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- Enabling true design for manufacturability
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8
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- Design challenges at 65 nm and beyond
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9
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- Accurate on-chip variation modeling to achieve design for manufacturability
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- Chang, K.J.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.