Fabrication of Ta3N5-Ag nanocomposite thin films with high resistivity and near-zero temperature coefficient of resistance

Thin Solid Films

Volumn 516, Issue 16, 2008, Pages 5409-5413

  Park, In Soo ^a   Park, Se Young ^a   Jeong, Geun Hee ^a   Na, Suok Min ^a,b   Suh, Su Jeong ^a  

^a Sungkyunkwan University   (South Korea)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

Embedded resistor; Resistivity; Ta N; Ta3N5 Ag nanocomposite; Temperature coefficient of resistance (TCR)

Indexed keywords

ELECTRIC CONDUCTIVITY; HEAT TREATMENT; NANOCOMPOSITES; PARTIAL PRESSURE; REACTIVE SPUTTERING; RESISTORS; TANTALUM COMPOUNDS; TEMPERATURE CONTROL;

EMBEDDED RESISTORS; POWER DENSITY; REACTIVE COSPUTTERING; TEMPERATURE COEFFICIENT OF RESISTANCE (TCR);

THIN FILMS;

EID: 43949086173     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.021     Document Type: Article

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