Prediction of scratch generation in chemical mechanical planarization

CIRP Annals - Manufacturing Technology

Volumn 57, Issue 1, 2008, Pages 559-562

  Chandra, A ^a   Karra, P ^a   Bastawros, A F ^a   Biswas, R ^a   Sherman, P J ^a   Armini, S ^b   Lucca, D A ^c  

^a Iowa State University of Science and Technology   (United States)

^b IMEC   (Belgium)

^c Oklahoma State University   (United States)

Author keywords

Agglomeration; Defectivity; Planarization

Indexed keywords

AGGLOMERATION; DEFORMATION; OPTIMIZATION; SLURRIES; SURFACE DEFECTS;

DEFECTIVITY; DIFFUSION LIMITED AGGLOMERATION (DLA); MULTI-SCALE MODELS; PLANARIZATION; SCRATCH GENERATION;

CHEMICAL MECHANICAL POLISHING;

EID: 43749114022     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2008.03.130     Document Type: Article

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