Micro electroforming of high-aspect-ratio metallic microstructures by using a movable mask

CIRP Annals - Manufacturing Technology

Volumn 57, Issue 1, 2008, Pages 227-230

  Zhu, D ^a   Zeng, Y B ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

Deposition; Electroforming; Microstructure

Indexed keywords

COST EFFECTIVENESS; CURRENT DENSITY; ELECTROFORMING; MASKS; PHOTORESISTORS;

CURRENT DENSITY DISTRIBUTION; METAL GROWTH DIRECTION;

MICROSTRUCTURE;

EID: 43649101267     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2008.03.092     Document Type: Article

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