Growth and formation mechanism of c-oriented ZnO nanorod arrays deposited on glass

Journal of Crystal Growth

Volumn 269, Issue 2-4, 2004, Pages 464-471

  Zhang, H Z ^a   Sun, X C ^a   Wang, R M ^a   Yu, D P ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

A1. Microstructure; A2. Growth mechanism; B1. Transmission electron microscopy; B1. ZnO nanorod arrays

Indexed keywords

GLASS; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; REACTION KINETICS; TRANSMISSION ELECTRON MICROSCOPY;

GROWTH DIRECTION; NANOROD ARRAYS; ULTRAVIOLET EMISSION DEVICES;

CRYSTAL GROWTH;

EID: 4344696673     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.05.078     Document Type: Article

References (23)

1. Huang M.H., Mao S., Feick H., Yan H., Wu Y., Kind H., Weber E., Russo R., Yang P. Science. 292:2001;1897.
2. (a) Kityk I.V., Ebothe J., Elchichou A., Addou M., Bougrine A., Sahraoui B. Phys. Stat. Sol. 234:2002;553;
3. (b) Hossein-Babaei F., Taghibakhsh F. Electron Lett. 36:2000;1815
4. (c) Devaney W.E., Chen W.S., Stewart J.M., Mickelsen R.A. Trans. Electron. Dev. 37:1990;428;
5. (d) Sun X.W., Wang L.D., Kwok H.S. Thin Solid Films. 360:2000;75;
6. (e) Yumoto H., Inoue T., Li S.J., Sako T., Nishiyama K. Thin Solid Films. 345:1999;38;
7. (f) Sargent R.A., Dunlop G.L., Darveniza M. IEEE Trans. Electron. Insul. 27:1992;580.
8. (a) Dai Z.R., Pan Z.W., Wang Z.L. Adv. Funct. Mater. 13:2003;9;
9. (b) Heo Y.W., Varadarajan V., Kaufman M., Kim K., Norton D.P., Ren F., Fleming P.H. Appl. Phys. Lett. 81:2002;3046;
10. (c) Huang M.H., Wu Y., Feick H., Tran N., Wber E., Yang P. Adv. Mater. 13:2001;113;
11. (d) Wu J.J., Liu S.C. Adv. Mater. 14:2002;215;
12. (e) Park W.I., Kim D.H., Jung S.W., Yi G.C. Appl. Phys. Lett. 80:2002;4232;
13. (f) Govender K., Boyle D.S., O'Brien P., Binks D., West D., Coleman D. Adv. Mater. 14:2002;1221;
14. (g) Li Y., Meng D.W., Zhang L.D., Phillipp F. Appl. Phys. Lett. 76:2000;2011.
15. Li Y.B., Bando Y., Sato T., Kurashima K. Appl. Phys. Lett. 81:2002;144.
16. Wang R.M., Xing Y.J., Xu J., Yu D.P. New J. Phys. 5:2003;115.
17. Zhu Y.W., Zhang H.Z., Sun X.C., Feng S.Q., Xu J., Zhao Q., Xiang B., Wang R.M., Yu D.P. Appl. Phys. Lett. 83:2003;144.
18. Yan M., Zhang H.T., Widjaja E.J., Chang R.P.H. J. Appl. Phys. 94:2003;5240.
19. Fons P., Iwata K., Yamada A., Matsubara K., Niki S., Nakahara K., Tanabe T., Takasu H. Appl. Phys. Lett. 77:2000;1801.
20. Kajikawa Y., Noda S., Komiyama H. Chem. Vapor Deposition. 8:2002;99.
21. Ohring M. The Material Science of Thin Films. 1991;Academic Press, New York. (Chapter 5).
22. Hu J.Q., Li Q., Wong N.B., Lee C.S., Lee S.T. Chem. Mater. 14:2002;1216.
23. Vanheusden K., Warren W.L., Seager C.H., Tallant D.K., Voigt J.A., Gnade B.E. J. Appl. Phys. 79:1996;7983.