Overlay advanced process control for foundry application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 2, 2004, Pages 735-743

  Wan, Xudong ^a   Zhou, Andy ^a   Zhang, Fjord ^a   Li, Jerry ^c   Gu, Xiaolan ^a   Mos, Evert ^b   Kisteman, Aernout ^b   Wang, Vivien ^b   Schuurhuis, Ron ^b  

^a SMIC   (China)

^b ASML   (Netherlands)

^c NONE

Author keywords

Advanced process control; Data sharing; Foundry; Lithographic overlay control

Indexed keywords

ADVANCED PROCESS CONTROL (APC); DATA SHARING; LITHOGRAPHIC OVERLAY CONTROL; OVERLAY CONTROL;

APPLICATION SPECIFIC INTEGRATED CIRCUITS; COMPUTER SIMULATION; CONTROL SYSTEMS; DATABASE SYSTEMS; LITHOGRAPHY; MICROPROCESSOR CHIPS; PROCESS ENGINEERING; SPURIOUS SIGNAL NOISE;

FOUNDRIES;

EID: 4344693817     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.547586     Document Type: Conference Paper

References (3)

1. "Improving overlay control through proper use of multilevel query APC", Timothy H. Conway, Alan Carlson, David A. Crow, Proc. SPIE Vol. 5044, p. 24-31, Advanced Process Control and Automation; Matt Hankinson, Christopher P. Ausschnitt; Eds., 2003.
2. "Knowledge Based APC Methodology for Overlay Control", David W. Laidler, Philippe Leray, David A. Crow, Keith E. Roberts, Proc. SPIE Vol. 5044, p. 32-43, Advanced Process Control and Automation; Matt Hankinson, Christopher P. Ausschnitt; Eds., 2003
3. "Effect of overlay APC control on cascading levels: perturbations of the reference level", Timothy H. Conway, Manish Misra, Alan P. Carlson, David A. Crow, Proc. SPIE Vol. 5038, p. 1002-1011, Metrology, Inspection, and Process Control for Microlithography XVII; Daniel J. Herr eds.; 2003