Improving Overlay Control Through Proper Use of Multi-Level Query APC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5044, Issue , 2003, Pages 24-31

  Conway, Tim ^a   Carlson, Alan ^b   Crow, David ^b  

^a CYPRESS SEMICONDUCTOR   (United States)

^b INFICON Patterning Solutions   (United States)

Author keywords

APC; Metrology; Overlay; Process control; Registration; Reticle; Scanners; Steppers

Indexed keywords

ALGORITHMS; CONTROL EQUIPMENT; DATA REDUCTION; FEEDBACK CONTROL; PREVENTIVE MAINTENANCE; VECTORS;

OVERLAY PROCESSES;

PROCESS CONTROL;

EID: 0242525089     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485304     Document Type: Conference Paper

References (1)

1. J. Baliga, Advanced Process Control: Soon to Be a Must, Semiconductor International, July 1999, p 76.