Knowledge Based APC Methodology for Overlay Control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5044, Issue , 2003, Pages 32-43

  Laidler, David ^a   Leray, Philippe ^a   Crow, David ^b   Roberts, Keith ^b  

^a IMEC   (Belgium)

^b INFICON Patterning Solutions   (United States)

Author keywords

Alignment; APC; ASML; ATHENA; Baseline Targeting and Control; Grid; Intrafield; Overlay

Indexed keywords

ERROR ANALYSIS; FEEDBACK CONTROL; KNOWLEDGE BASED SYSTEMS; OPTIMIZATION; STABILITY; TECHNOLOGY;

OVERLAY CONTROL;

PROCESS CONTROL;

EID: 0242441475     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485308     Document Type: Conference Paper

References (5)

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2. E.A. Me Fadden, C.P. Ausschnitt, "A Computer Aided Engineering Workstation for Registration Control", Proc. SPIE, Vol. 1087 (1989) pp. 255-266.
3. C.P. Ausschnitt, B. Barker, P. Hartswick, A. Thomas, "Photocluster Control System Implementation at the IBM Advanced Semiconductor Technology Center", Proc. SPIE, Vol. 2336 (1994) pp 17-24.
4. C.P. Ausschnitt, A.C. Thomas, T.J. Wiltshire, "Advanced DUV Photolithography in a Pilot Line Environment", IBM Journal of Research and Development, Vol. 41, Number 1/2, January/March, 1997.
5. A. Carlson, D. DiBiase, "Effect of Metrology Time Delay on Overlay APC", Proc. SPIE, Vol. 4692 (2002) pp. 1-16.