Preparation of mesoporous silica films using sol-gel process and argon plasma treatment

Chemical Physics Letters

Volumn 395, Issue 1-3, 2004, Pages 70-74

  Palaniappan, Alagappan ^a   Zhang, Jian ^a   Su, Xiaodi ^a   Tay, Francis E H ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; SILICON DIOXIDE;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FILM; INFRARED SPECTROSCOPY; NANOTECHNOLOGY; POROSITY; STRUCTURE ANALYSIS; TECHNIQUE; THERMAL ANALYSIS; X RAY CRYSTALLOGRAPHY;

EID: 4344648018     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2004.07.060     Document Type: Article

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