Effect of substrate temperature on crystal orientation and residual stress in radio frequency sputtered gallium-nitride films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1587-1590

  Kusaka, Kazuya ^a   Hanabusa, Takao ^a   Tominaga, Kikuo ^a   Yamauchi, Noriyoshi ^a,b  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b TEXIA Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPACING; CRYSTAL NUCLEI; MECHANICALLY STABLE FILMS; SUBSTRATE TEMPERATURES;

ATOMIC FORCE MICROSCOPY; COMPRESSIVE STRESS; CONTAMINATION; CRYSTAL ORIENTATION; GALLIUM NITRIDE; RESIDUAL STRESSES; SAPPHIRE; SINGLE CRYSTALS; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 4344639653     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1759348     Document Type: Conference Paper

References (18)

1. S. Nakamura, T. Mukai, and M. Senoh, Appl. Phys. Lett. 64, 1687 (1994).
2. S. Nakamura, M. Senoh, N. Iwasa, and S. Nagahama, Jpn. J. Appl. Phys., Part 2 34, L797 (1995).
3. S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyohu, and Y. Sugimoto, Jpn. J. Appl. Phys., Part 2 33, L74 (1996).
4. S. Miyoshi, K. Onabe, N. Ohkouchi, H. Yaguchi, and R. Ito, J. Cryst. Growth 124, 432 (1992).
5. Y. Kobayashi, F. Scholtz, and N. Kobayashi, Jpn. J. Appl. Phys., Part 1 36, 2592 (1997).
6. H. Sato, H. Takahashi, A. Watanabe, and H. Ota, Appl. Phys. Lett. 68, 3617 (1996).
7. R. V. Stuart, G. K. Wehner, and G. S. Anderson, J. Appl. Phys. 40, 803 (1969).
8. T. Hanabusa, Mater. Sci. Res. Int. 5, 63 (1999).
9. H. P. Maruska and J. J. Tietjen, Appl. Phys. Lett. 14, 327 (1969).
10. T. Detchprohm, K. Hiramatsu, K. Itoh, and I. Akasaki, Jpn. J. Appl. Phys., Part 2 31, L1454 (1992).
11. E. Macherauch and P. Müller, Z. Angew. Phys. 13, 305 (1961).
12. V. A. Savastenko and A. U. Sheleg, Phys. Status Solidi A 48, K135 (1978).
13. K. Kusaka, K. Furutani, T. Kikuma, T. Hanabusa, and K. Tominaga, Mater. Sci. Res. Int. 8, 187 (2002).
14. U. Geyer, U. von Hülsen, and H. Kopf, J. Appl. Phys. 83, 3065 (1998).
15. D. W. Hoffman and J. A. Thornton, Thin Solid Films 45, 387 (1977).
16. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. A 3, 576 (1985).
17. G. Este, R. Surridge, and W. D. Westwood, J. Vac. Sci. Technol. A 4, 989 (1986).
18. G. Este and W. D. Westwood, J. Vac. Sci. Technol. A 5, 1982 (1987).