Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 503-514

  Lu, Wei ^a   Archie, Charles ^a   Stone, Stacey ^b   Kang, Hyoung ^b   Chitturi, Prasanna ^b  

^a IBM MICROELECTRONICS   (United States)

^b Thermo Fisher Scientific   (United States)

Author keywords

Accuracy; Chemical Mechanical Planarization (CMP); Dual beam (DB); Focused Ion Beam (FIB); Precision; Reference Measurement System (RMS); Total Measurement Uncertainty (TMU); Total Process Precision (TPP); X SEMor cross section SEM

Indexed keywords

CHEMICAL MECHANICAL PLANARIZATION (CMP); DUAL BEAM (DB); REFERENCE MEASUREMENT SYSTEM (RMS); TOTAL MEASUREMENT UNCERTAINITY (TMU); TOTAL PROCESS PRECISION (TPP);

CALIBRATION; CAPACITANCE; DIELECTRIC MATERIALS; IMAGE ANALYSIS; ION BEAMS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY;

PROCESS CONTROL;

EID: 4344626396     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538051     Document Type: Conference Paper

References (5)

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5. th Annual International Symposium on Microlithography, 2001