Dualbeam metrology: A new technique for optimizing 0.13 μm photo processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 423-435

  Berger, Steven ^a   Desloge, Denis ^a   Virgalla, Robert ^a   Davis, Todd ^b   Paxton, Ted ^b   Witko, David ^b  

^a Thermo Fisher Scientific   (United States)

^b ASML US Inc   (United States)

Author keywords

CD measurement; DualBeam; Litho cell optimization; Process latitude; Resist sidewall

Indexed keywords

IMAGING TECHNIQUES; INTEGRATED CIRCUITS; ION BEAMS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY;

FOCUSED ION BEAMS (FIB); LITHO CELL OPTIMIZATION;

PHOTOLITHOGRAPHY;

EID: 0034758310     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436768     Document Type: Article

References (9)

1. Advanced technology for extending optical lithography
2. Optical lens specifications from a user's perspective
3. Sub-resolution assist feature and off-axis illumination optimization for 200 and 240 nm contact windows using 248 nm lithography
4. Towards a comprehensive control of full field image quality in optical photolithography
5. Focused ion beam repair in microelectronics
6. High-resolution focused ion beams
7. 2O enhanced focused ion beam micromachining
8. Focused ion beam deposition of Pt containing films