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Volumn 3, Issue , 2004, Pages

The tunneling field effect transistor (TFET): The temperature dependence, the simulation model, and its application

Author keywords

[No Author keywords available]

Indexed keywords

CIRCUIT THEORY; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; ELECTRIC RESISTANCE; ELECTRON TUNNELING; GATES (TRANSISTOR); INTEGRATED CIRCUIT LAYOUT; LEAKAGE CURRENTS; RAPID THERMAL ANNEALING; THERMAL EFFECTS; ZENER DIODES;

EID: 4344599123     PISSN: 02714310     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (42)

References (8)
  • 1
    • 3643062973 scopus 로고
    • Silicon surface transistor
    • July
    • W. M. Reddick and G. A. J. Amaratunga, "Silicon surface transistor," Appl. Phys. Lett., vol. 67, no. 4, pp. 494-496, July 1995.
    • (1995) Appl. Phys. Lett. , vol.67 , Issue.4 , pp. 494-496
    • Reddick, W.M.1    Amaratunga, G.A.J.2
  • 6
    • 0033341645 scopus 로고    scopus 로고
    • Room temperature negative differential conductance in three-terminal silicon surfcae tunneling device
    • Oct.
    • J. Koga and A. Toriumi, "Room temperature negative differential conductance in three-terminal silicon surfcae tunneling device," IEEE Electron Device Letters, vol. 20, no. 10, pp. 529-531, Oct. 1999.
    • (1999) IEEE Electron Device Letters , vol.20 , Issue.10 , pp. 529-531
    • Koga, J.1    Toriumi, A.2
  • 7
    • 0033894378 scopus 로고    scopus 로고
    • A new model for the description of the gate voltage and temperature dependence of gate induced drain leakage (gidl) in the low electric field region
    • January
    • M. Rosar, B. Leroy, and G. Schweeger, "A new model for the description of the gate voltage and temperature dependence of gate induced drain leakage (gidl) in the low electric field region," IEEE Transactions on Electron Devices, vol. 47, no. 1, pp. 154-159, January 2000.
    • (2000) IEEE Transactions on Electron Devices , vol.47 , Issue.1 , pp. 154-159
    • Rosar, M.1    Leroy, B.2    Schweeger, G.3
  • 8
    • 0026819795 scopus 로고
    • A new recombination model for device simulation including tunnling
    • Feb.
    • G. A. M. Hurkx, D. B. M. Klaassen, and M. P. G. Knuvers, "A new recombination model for device simulation including tunnling," IEEE Trans. Electron Devices, vol. 39, pp. 331-338, Feb. 1992.
    • (1992) IEEE Trans. Electron Devices , vol.39 , pp. 331-338
    • Hurkx, G.A.M.1    Klaassen, D.B.M.2    Knuvers, M.P.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.