Characteristics of a plasma sheath in a radio frequency biased voltage

Physics of Plasmas

Volumn 11, Issue 8, 2004, Pages 3840-3844

  Zhang, Yu ^a   Liu, Jinyuan ^a   Liu, Yue ^a   Wang, X ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC POTENTIAL; ELECTRODES; IONS; MATHEMATICAL MODELS; NATURAL FREQUENCIES; PLASMA COLLISION PROCESSES; PLASMA DENSITY; PROBLEM SOLVING;

ION CURRENT DENSITY; ION ENERGY DISTRIBUTION; RADIO FREQUENCIES (RF);

PLASMA SHEATHS;

EID: 4344570975     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1764507     Document Type: Article

References (16)

1. M. A. Sobolewski, J. K. Olthoff, and Y. C. Wang, J. Appl. Phys. 85, 3966 (1999).
2. A. Metze, D. W. Etnie, and H. J. Oskam, J. Appl. Phys. 60, 3081 (1986).
3. M. A. Lieberman, IEEE Trans. Plasma Sci. 16, 638 (1988).
4. M. A. Lieberman, IEEE Trans. Plasma Sci. 17, 338 (1989).
5. V. A. Godyak and N. Sternberg, Phys. Rev. A 42, 2299 (1990).
6. N. Sternberg and V. A. Godyak, J. Comput. Physiol. 111, 347 (1994).
7. M. A. Sobolewski, Phys. Rev. E 56, 1001 (1997).
8. J. Gierling and K. U. Riemann, J. Appl. Phys. 83, 3521 (1998).
9. K. U. Riemann, J. Appl. Phys. 65, 999 (1989).
10. E. A. Edelberg and E. S. Aydil, J. Appl. Phys. 86, 4799 (1999).
11. Z. L. Dai, Y. N. Wang, and T. C. Ma, Phys. Rev. E 65, 036403 (2002).
12. P. A. Miller and M. E. Riley, J. Appl. Phys. 82, 3689 (1997).
13. T. Panagopoulos and D. J. Economou, J. Appl. Phys. 85, 3435 (1999).
14. M. A. Sobolewski, Phys. Rev. E 62, 8540 (2000).
15. D. Boss, T. R. Covindan, and M. Meyyappan, J. Appl. Phys. 87, 7176 (2000).
16. M. A. Sobolewski, Phys. Rev. E 59, 1059 (1999).