Material and process development of tri-level resist system in KrF and ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 773-781

  Shibata, Tsuyoshi ^a   Nakagawa, Seiji ^a   Sato, Yasuhiko ^a   Sho, Koutaro ^a   Hayashi, Hisataka ^a   Abe, Junko ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Anti reflection; ArF; KrF; Pattern transfer; RIE; SOG; Spin on carbon; Tri level resist

Indexed keywords

ACIDITY; CARBON; DENSITY (OPTICAL); DRY ETCHING; FABRICATION; GLASS; LIGHT REFLECTION; LITHOGRAPHY;

PATTERN TRANSFER;

PHOTORESISTS;

EID: 0036030129     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474278     Document Type: Conference Paper

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