Advanced alignment optical system for DUV scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 2, 2004, Pages 949-957

  Nagayama, Tadashi ^a   Yasuda, Masahiko ^a   Kanaya, Yuho ^a   Masada, Takahiro ^a   Sugaya, Ayako ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Alignment; Alignment mark; Image processing; Optical system; Scanner; Stepper

Indexed keywords

ALIGNMENT MARK; NUMERICAL APERTURE (NA); SCANNER; STEPPER;

ALIGNMENT; COMPUTER SIMULATION; ERROR ANALYSIS; IMAGE PROCESSING; REFLECTION; SCANNING; SILICON WAFERS; WAVEFRONTS;

OPTICAL SYSTEMS;

EID: 4344617186     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535083     Document Type: Conference Paper

References (3)

1. th edition, Pergamon Press, Oxford, (1975)
2. A.Sugaya et al, "Innovative Optical Alignment Technique for CMP Wafers", Proc Spie, Vol4691, pp954(2002)
3. T.Nagayama et al, "New Method to Reduce alignment Error Caused by Optical System", Proc Spie, Vol5038, pp849(2003)