A new process for accurate alignment using laser ablation technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 960-967

  Ikegami, Hiroshi ^a   Kawano, Kenji ^a   Ishigo, Kazutaka ^a   Higashiki, Tatsuhiko ^a   Hayasaka, Nobuo ^a   Yoshitaka, Naoto ^b   Kashiwagi, Hideaki ^b   Kobayashi, Masayoshi ^c   Ogawa, Yoichi ^c   Ito, Shinichi ^a  

^a TOSHIBA CORPORATION   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

^c DAINIPPON SCREEN MFG CO LTD   (Japan)

Author keywords

Accurate Alignment; Al Film; Alignment Mark; Laser Ablation; Lithography; Plasma Formation

Indexed keywords

ANTIREFLECTION COATINGS; DEPOSITION; LASER BEAM EFFECTS; LITHOGRAPHY; METALLIC FILMS; SURFACE TOPOGRAPHY; THIN FILMS; TITANIUM NITRIDE;

ACCURATE ALIGNMENT; AL FILMS; ALIGNMENT MARK; PLASMA FORMATION;

LASER ABLATION;

EID: 3843068659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534907     Document Type: Conference Paper

References (3)

1. S. Ito et al. " A novel laser ablation patterning with organic film in running water" Proceedings of SPIE. 5039 (2003).
2. M. von Allmen and A. Blatter, Laser-Beam Interactions with Materials, 51, Verlag, Berlin (1994).
3. R. Timm et al. "Ablation and blow-off characteristics at 248 nm of Al, Sn and Ti targets used for thin film pulsed laser deposition" J. Appl. Phys. 80, 1794 (1996)