Arrays of un-cooled micro-bolometers based on amorphous silicon-germanium thin films deposited by plasma

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2552-2555

  Moreno, M ^a   Kosarev, A ^a   Torres, A ^a   Juarez, I ^a  

^a INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

Author keywords

Amorphous semiconductors; Devices; Germanium; Sensors; Silicon

Indexed keywords

AMORPHOUS SEMICONDUCTORS; AMORPHOUS SILICON; CURRENT VOLTAGE CHARACTERISTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SENSORS;

MICROBOLOMETER ARRAYS; THERMO SENSING FILMS;

THIN FILMS;

EID: 43049147299     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.039     Document Type: Article

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