The effect of deposition parameters on radiofrequency sputtered molybdenum thin films

Journal of Physics Condensed Matter

Volumn 20, Issue 5, 2008, Pages

  Khatri, H ^a   Marsillac, S ^a  

^a UNIVERSITY OF TOLEDO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; HIGH PRESSURE EFFECTS; PARAMETER ESTIMATION; SPUTTER DEPOSITION; STRAIN RATE; SUBSTRATES;

DEPOSITION PARAMETERS; GLASS SUBSTRATES; MOLYBDENUM THIN FILMS; STRAIN REVERSAL;

THIN FILMS;

EID: 43049114986     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/05/055206     Document Type: Article

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