Making the surface of nanocrystalline Ni on an Si substrate ultrasmooth by direct electrodeposition

Scripta Materialia

Volumn 59, Issue 1, 2008, Pages 103-106

  Sansoz, F ^a,b   Stevenson, K D ^a   Govinthasamy, R ^a   Murthy, N S ^c  

^a University of Vermont ^*  (United States)

^b UNIVERSITY OF VERMONT   (United States)

^c RUTGERS UNIVERSITY   (United States)

Author keywords

Atomic force microscopy; Electroplating; Nanocrystalline metal; Nickel; Surface structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRODEPOSITION; GRAIN SIZE AND SHAPE; SURFACE MORPHOLOGY;

HIGH-RESOLUTION PROBES; NANOCRYSTALLINE METALS; NON-DESTRUCTIVE METHOD;

NANOCRYSTALLINE MATERIALS;

EID: 43049113447     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2008.02.039     Document Type: Article

References (19)

1. El-Sherik A.M., and Erb U. J. Mater. Sci. 30 (1995) 5743
2. Ebrahimi F., Bourne G.R., Kelly M.S., and Matthews T.E. Nanostruct. Mater. 11 (1999) 343
3. Schuh C.A., Nieh T.G., and Yamasaki T. Scripta Mater. 46 (2002) 735
4. Yang B., Vehoff H., and Hempelmann R. Int. J. Mat. Res. 97 (2006) 1220
5. Poulopoulos P., Lindner J., Farle M., and Baberschke K. Surface Sci. 437 (1999) 277
6. Mitra R., Hoffman R.A., Madan A., and Weertman J.R. J. Mater. Res. 16 (2001) 1010
7. Wang L., Gao Y., Xu T., and Xue Q. Mater. Chem. Phys. 99 (2006) 96
8. Mishra R., and Balasubramaniam R. Corros. Sci. 46 (2004) 3019
9. Wang L., Zhang J., Gao Y., Xue Q., Hu L., and Xu T. Scripta Mater. 55 (2006) 657
10. Oniciu L., and Muresan L. J. Appl. Electrochem. 21 (1991) 565
11. Kollia C., Loisos Z., and Spyrellis N. Surf. Coat. Technol. 45 (1991) 155
12. Morales J., Krijer S.M., Esparza P., Gonzalez S., Vasquez L., Salvarezza R.C., and Arvia A.J. Langmuir 12 (1996) 1068
13. Saitou M. Phys. Rev. B 66 (2002) 073416
14. Uhm H.S., and Hwang S.K. Metal Mater. Int. 10 (2004) 113
15. Pavlatou E.A., Raptakis M., and Spyrellis N. Surf. Coat. Technol. 201 (2007) 4571
16. Klinov D., and Magonov S. Appl. Phys. Lett. 84 (2004) 2697
17. Elson J.M., and Bennett J.M. Appl. Optics 34 (1995) 201
18. Saitou M., Oshikawa W., and Makabe A. J. Phys. Chem. Solid 63 (2002) 1685
19. Cremona M., Mauricio M.H.P., Scarvada Do Carmo L.C., Prioli R., Nunes V.B., Zannette S.I., Caride A.O., and Albuquerque M.P. J. Microsc. 197 (2000) 260