Chemical nature of colossal dielectric constant of Ca Cu3 Ti4 O12 thin film by pulsed laser deposition

Applied Physics Letters

Volumn 92, Issue 17, 2008, Pages

  Deng, Guochu ^a   Xanthopoulos, Nicolas ^a   Muralt, Paul ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER COMPOUNDS; PERMITTIVITY; PULSED LASER DEPOSITION;

COLOSSAL DIELECTRIC CONSTANT; STOICHIOMETRIC COMPOSITION;

THIN FILMS;

EID: 43049106445     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2919076     Document Type: Article

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