Width distribution of contact lines on a disordered substrate

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 69, Issue 3 2, 2004, Pages

  Moulinet, Sébastien ^a,c   Rosso, Alberto ^b   Krauth, Werner ^a   Rolley, Etienne ^a  

^a CNRS   (France)

^b UNIVERSITY OF GENEVA   (Switzerland)

^c UNIVERSITÉ LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; BOUNDARY CONDITIONS; CHARGE COUPLED DEVICES; CRACKS; DEFORMATION; DYNAMICS; ELASTICITY; EQUATIONS OF MOTION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; NUMERICAL ANALYSIS; SIGNAL TO NOISE RATIO; VISCOSITY;

ELASTIC ENERGY; GAUSSIAN APPROXIMATION; JOANNE-DE-GENNES MODEL; SHORT-RANGE ELASTIC INTERACTIONS;

SURFACE ROUGHNESS;

EID: 42749107848     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.69.035103     Document Type: Article

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33. Let us evaluate the number of independent configurations that can be obtained in our experiment. For the lower magnification the observed length of the line is 4.7 mm. During an experiment the total displacement is of the order of 15 mm. As the maximum width of the contact line is ∼30 μm, the number of independent configuration is 500. As an example, for a size L = 500 μm, φ is then determined from typically 5000 independent samples.