An experimental study of the polishing process for MgO single crystal substrate

Key Engineering Materials

Volumn 329, Issue , 2007, Pages 225-230

  Wang, K ^a   Kang, R K ^a   Jin, Z J ^a   Wang, N H ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Material removal rate; MgO single crystal; Polishing; Surface roughness

Indexed keywords

MAGNESIUM COMPOUNDS; POLISHING; SILICA; SURFACE ROUGHNESS;

MATERIAL REMOVAL RATE (MRR); MGO SINGLE CRYSTALS;

SINGLE CRYSTALS;

EID: 33846387548     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-416-2.225     Document Type: Article

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