Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD

Applied Surface Science

Volumn 254, Issue 15, 2008, Pages 4546-4551

  Kim, Byungwhan ^a   Kim, Su Yeon ^a  

^a Sejong University   (South Korea)

Author keywords

Charge density; Model; Neural network; Plasma enhanced chemical vapor deposition; Silicon nitride film

Indexed keywords

CHARGE DENSITY; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; THIN FILMS;

GENERALIZED REGRESSION NEURAL NETWORK (GRNN); PRESSURE CONTROLLED CHARGE DENSITY; SILICON NITRIDE FILMS;

NEURAL NETWORKS;

EID: 42749087556     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.01.047     Document Type: Article

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