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Volumn 19, Issue 12, 2008, Pages

Charge dissipation in e-beam lithography with Novolak-based conducting polymer films

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTING POLYMERS; ELECTRON BEAM LITHOGRAPHY; INSULATING MATERIALS; POLYMERIZATION;

EID: 42549145517     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/12/125302     Document Type: Article
Times cited : (16)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.