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Volumn 19, Issue 12, 2008, Pages
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Charge dissipation in e-beam lithography with Novolak-based conducting polymer films
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Author keywords
[No Author keywords available]
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Indexed keywords
CONDUCTING POLYMERS;
ELECTRON BEAM LITHOGRAPHY;
INSULATING MATERIALS;
POLYMERIZATION;
CHARGE DISSIPATION;
CONDUCTING LAYERS;
CONDUCTING POLYMER FILMS;
SURFACE LAYERS;
POLYMER FILMS;
COPPER DERIVATIVE;
MONOMER;
POLYMER;
SOLVENT;
THIOPHENE;
ARTICLE;
CHEMICAL REACTION;
ELECTRIC CONDUCTIVITY;
ELECTRON BEAM;
FILM;
OXIDATION;
POLYMERIZATION;
PRIORITY JOURNAL;
SOLUBILITY;
THICKNESS;
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EID: 42549145517
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/12/125302 Document Type: Article |
Times cited : (16)
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References (25)
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