Plasma chemical reactions of thin nickel films

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 552-555

  Quaas, M ^a   Wulff, H ^a   Ivanova, O ^a   Helm, C A ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Oxidation kinetics; Plasma wall interaction; X ray analysis

Indexed keywords

ATOMIC FORCE MICROSCOPY; NICKEL; OXYGEN; PLASMAS; REACTION KINETICS; X RAY DIFFRACTION ANALYSIS;

MICROWAVE PLASMAS; NICKEL CLUSTERS; OXIDATION KINETICS; PLASMA WALL INTERACTIONS;

THIN FILMS;

EID: 42449149050     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2642     Document Type: Conference Paper

References (13)

1. Jacob W. Thin Solid Films 1998; 324:1.
2. Quade A, Steffen H, Hippler R, Wulff H. Anal. Bioanal. Chem. 2002; 374:720.
3. Itakura AN, Shimoda M, Kitajma M. Appl. Surf. Sci. 2003; 216:41.
4. Jiang JC, Lian K, Meletis EL Thin Solid Films 2002; 411:203.
5. Niklasson GA, Karmhag R. Surf. Sci. 2003; 532-535:324.
6. Karmhag R, Niklasson G, Nygren M. J. Appl. Phys. 2001; 89:3012.
7. Werner F, Kozec D, Engemann J. Plasma Sources Sei. Technol. 1994; 3:473.
8. Wulff H, Steffen H. Characterization of thin films. In Low Temperature Plasma Physics, Hippler R, Pfau S, Schmidt M, Schoenbach KH (eds). WILEY-VCH: Berlin; 2001; 253.
9. Sato T, Sato S, Tamura K, Okuwaki A. Br. Ceram. Trans. J. 1992; 91: 117.
10. Ginstling AM, Brounsthein Bl. J. Appl. Chem. USSR (Consultant Bureau Translation) 1950; 23:1327.
11. Carter RE. J. Chem. Phys. 1960; 34:2010.
12. Sato T, Murakami T, Ende T, Shimada M, Komuya K, Komatsu M, Kameda T. J. Am. Ceram. Soc. 1991 ; 26:1749.
13. Frade JR, Cable MJ. J. Am. Ceram. Soc. 1995; 78:90.