Influence of oxygen plasma treatment on the microstructure of SnO x thin films

Thin Solid Films

Volumn 411, Issue 2, 2002, Pages 203-210

  Jiang, J C ^a   Lian, K ^b   Meletis, E I ^a  

^a Louisiana State University   (United States)

^b LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

Electron diffraction; Oxygen plasma treatment; Sno2 thin films; Transmission electron microscopy

Indexed keywords

CHEMICAL SENSORS; ELECTRON BEAMS; ELECTRON DIFFRACTION; EVAPORATION; ION BEAM LITHOGRAPHY; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; SOLAR CELLS; TIN COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

ELECTRON BEAM EVAPORATION; OXYGEN-PLASMA TREATMENT; SNO2 THIN FILMS; ULTRAVIOLET (UV) LITHOGRAPHY;

THIN FILMS;

EID: 10644286724     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00288-2     Document Type: Article

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