Study of the thermal and intrinsic stress of large area diamond film prepared by HFCVD

Key Engineering Materials

Volumn 375-376, Issue , 2008, Pages 123-127

  Xu, Feng ^a   Zuo, Dunwen ^a   Lu, Wenzhuang ^a   Wang, Min ^a   Zhang, Haiyu ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

Diamond film; HFCVD; Intrinsic stress; Thermal stress

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FINITE ELEMENT METHOD; MICROSTRUCTURE; RESIDUAL STRESSES; STRESS ANALYSIS; THERMAL STRESS; THICK FILMS;

COOLING VELOCITY; HOT FILAMENT CHEMICAL VAPOR DEPOSITED (HFCVD) SYSTEM; INTRINSIC STRESS;

DIAMOND FILMS;

EID: 42449114392     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/kem.375-376.123     Document Type: Conference Paper

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