Some Key points for EACVD Thick Diamond Film Preparation

Key Engineering Materials

Volumn 258-259, Issue , 2004, Pages 517-521

  Zuo, D W ^a   Song, S L ^a   Xiang, B K ^a   Wang, M ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

CVD diamond; Electron assisted CVD; Preparation; Thick film

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; GRAPHITE; HEATING; HYDROCARBONS; MACHINING; TEMPERATURE DISTRIBUTION; THICK FILMS; DIAMONDS; SUBSTRATES;

ELECTRON-ASSISTED CHEMICAL VAPOR DEPOSITION (EACVD); CVD DIAMONDS; ELECTRON-ASSISTED CVD; FILAMENTS; SUBSTRATE MATERIALS;

DIAMOND FILMS; THICK FILMS;

EID: 1642279712     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (6)

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2. L.J. Xie, X.D. Liu, S.Q. Pang, et al: Machinist (1997), p. 2 (in Chinese)
3. X.F. Li, D.W. Zuo and M. Wang: Aviation Precision Manufacturing Technology Vol. 35 (1999), p. 8 (in Chinese)
4. D.W. Zuo, B.K. Xiang, W.Z. Lu, et al: Proc. 6th ICPMT (Xi'an 2002).
5. F. Xu: Study on Loser Processing and Machining of CVD Diamond Thick Film (Master Degree Thesis of Nanjing University of Aeronautics & Astronautics 2002). (in Chinese)
6. J.K. Park, V.M. Ayres and J. Asmussen: Diamond and Related Materials Vol. 9 (2000), p. 1154