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Volumn 62, Issue 7, 2000, Pages 4535-4544

Tin-vacancy acceptor levels in electron-irradiated n-type silicon

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EID: 4243678567     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.62.4535     Document Type: Article
Times cited : (46)

References (45)
  • 16
    • 0001137488 scopus 로고    scopus 로고
    • G. D. Watkins, in Defects and Diffusion in Silicon Processing, edited by T. Diaz de la Rubia, S. Coffa, P. A. Stolk, C. S. Ref MRS symposia Proceedings No. 469 (Materials Research Society, Pittisburgh, 1997).
    • (1997) Defects and Diffusion in Silicon Processing
    • Watkins, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.