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Volumn , Issue 1530, 2000, Pages 211-220

Mikromechanische Sensoren und Aktoren - Funktionsprinzipien, Technologien und Applikationen

Author keywords

[No Author keywords available]

Indexed keywords


EID: 4243549323     PISSN: 00835560     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article
Times cited : (3)

References (8)
  • 1
    • 31444450842 scopus 로고    scopus 로고
    • Hochgenauer Beschleunigungssensor B290 in Mikrotechnologie
    • [Haf93]
    • [Haf93] Hafen, M.; Geßner, T. et al.: "Hochgenauer Beschleunigungssensor B290 in Mikrotechnologie", Sensor 93 Bd. III, S. 279
    • Sensor 93 , vol.3 , pp. 279
    • Hafen, M.1    Geßner, T.2
  • 2
    • 31444442040 scopus 로고
    • [Heub86] Springer-Verlag Berlin
    • [Heub86] Mikromechanik. Springer-Verlag Berlin, 1986
    • (1986) Mikromechanik
  • 3
    • 84941368224 scopus 로고    scopus 로고
    • A new bulk micromachined gyroscope with vibration enhancement by coupled resonators
    • [Hil98]
    • [Hil98] Hiller, K. et al.: A new bulk micromachined gyroscope with vibration enhancement by coupled resonators, Proc. of MICRO SYSTEM Technologies 1998, p. 115
    • (1998) Proc. of Micro System Technologies , pp. 115
    • Hiller, K.1
  • 5
    • 0033360028 scopus 로고    scopus 로고
    • Synchronously Working Micromirrors for Beam Steering - Design and Application Aspects
    • [Kurth98]
    • [Kurth98] Kurth, S.; Kehr, K.; Mehner, J.; Kaufmann, C.; Hahn, R.; Seidel, R.; Dötzel, W.; Gessner, T.: "Synchronously Working Micromirrors for Beam Steering - Design and Application Aspects", Proc. of SPIE Vol. 3787-06, pp. 63-73
    • Proc. of SPIE , vol.3787 , Issue.6 , pp. 63-73
    • Kurth, S.1    Kehr, K.2    Mehner, J.3    Kaufmann, C.4    Hahn, R.5    Seidel, R.6    Dötzel, W.7    Gessner, T.8
  • 7
    • 0028333279 scopus 로고
    • A single mask, single-cristal silicon, reactive ion etching process for microelectromechanical structures
    • [Sha94]
    • [Sha94] Shaw, K.A./Zhang, Z.L./Mac Donald, N.C.: "A single mask, single-cristal silicon, reactive ion etching process for microelectromechanical structures", Sensors and Actuators A40 (1994) S.63-70
    • (1994) Sensors and Actuators , vol.A40 , pp. 63-70
    • Shaw, K.A.1    Zhang, Z.L.2    Mac Donald, N.C.3
  • 8
    • 0032138896 scopus 로고    scopus 로고
    • Micromachined inertial sensors
    • [YAN98]
    • [YAN98] Yazdi, N.; Ayazi, F.; Najafi, K.: "Micromachined inertial sensors", Proc. of the IEEE vol. 86, No. 28(1998), p. 1640
    • (1998) Proc. of the IEEE , vol.86 , Issue.28 , pp. 1640
    • Yazdi, N.1    Ayazi, F.2    Najafi, K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.