Long-term stability of single-crystal silicon microresonators

Sensors and Actuators, A: Physical

Volumn 115, Issue 1, 2004, Pages 23-27

  Koskenvuori, M ^a   Mattila, T ^b   Haara A ^b   Kiihamaki J ^b   Tittonen, I ^a   Oja, A ^b   Seppa H ^b  

^a AALTO UNIVERSITY   (Finland)

^b VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

Aging; Long term stability; Micromechanical resonator; Packaging; Vacuum encapsulation

Indexed keywords

AGING OF MATERIALS; ATMOSPHERIC HUMIDITY; CRYSTAL RESONATORS; OSCILLATORS (ELECTRONIC); SINGLE CRYSTALS; STABILITY; TRANSCEIVERS; VACUUM APPLICATIONS;

LONG-TERM STABILITY; MICROMECHANICAL RESONATORS; VACUUM ENCAPSULATION;

SEMICONDUCTING SILICON;

EID: 4243144936     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2004.03.013     Document Type: Article

References (10)

1. J.R. Vig, A. Ballato, in E.P. Papadakis (Ed.), Ultrasonic Instruments and Devices, Academic Press, 1999 (Chapter 7).
2. IEEE Std. 802.15.1; IEEE Std. 802.15.4.
3. Walls F.L., Vig J.R. Fundamental limits of the frequency stabilities of crystal oscillators. IEEE Trans. Ultrason. Ferroelect. Freq. Contr. 42:1995;576.
4. D. Salt, Handbook of Quartz Crystal Devices, Van Nostrand Reinhold, Wokingham, UK, 1987.
5. B. Razavi, RF Microlectronics, Prentice Hall, USA, 1998, p. 214.
6. Nguyen C.T.-C. Frequency-selective MEMS for miniaturized low-power communication devices. IEEE Trans. Microwave Theory Tech. 47:1999;1486.
7. Mattila T., et al. A 12 MHz micromechanical bulk acoustic mode oscillator. Sensors Actuators A. 101:2002;1-9.
8. V. Kaajakari, et al., Square-extensional mode single-crystal silicon micromechanical resonator for low phase noise oscillator applications, IEEE Electron Devices Lett. 25 (2004) 173-175.
9. M. Koskenvuori, et al., Enhancing the electromechanical coupling in bulk acoustic microresonators, in: Proceedings, Eurosensors XVI, Prague, Czech Republic, September 15-18, 2002, pp. 383-384.
10. Okorn-Schmidt H.F., et al. Characterization of DI water/O-3 oxidation of Si (1. 0 0) and Si (1 1 1) surfaces by OCP measurements Solid State Phenomena. 76/77:2002;161-164.