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Volumn , Issue , 2007, Pages 938-941
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A novel characterization method for thermal thin-film properties applied to PECVD silicon nitride
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Author keywords
[No Author keywords available]
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Indexed keywords
NITRIDES;
NONMETALS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING FILMS;
SILICON;
SILICON NITRIDE;
THIN FILM DEVICES;
CHARACTERIZATION METHODS;
MICROMACHINED;
PECVD SILICON NITRIDE;
SENSOR DEVICES;
THIN-FILM PROPERTIES;
SENSORS;
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EID: 42149181214
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICSENS.2007.4388557 Document Type: Conference Paper |
Times cited : (10)
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References (6)
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