Thermal characterization of surface-micromachined silicon nitride membranes for thermal infrared detectors

Journal of Microelectromechanical Systems

Volumn 6, Issue 1, 1997, Pages 55-61

  Eriksson, Pontus ^a,c   Andersson, Jan Y ^a,b,d   Stemme, Göran ^a,e,f,g  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b ACREO AB   (Sweden)

^c LINKÖPING INSTITUTE OF TECHNOLOGY   (Sweden)

^d Swed Institute of Microelectronics   (Sweden)

^e CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^f Silicon Sensor Research Group

^g Chalmers University of Technology ^*

Author keywords

Silicon nitride membranes; Surface micromachining

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; HEAT TRANSFER; INFRARED DETECTORS; MATHEMATICAL MODELS; MEMBRANES; MICROMACHINING; PRESSURE EFFECTS; SILICON NITRIDE; SPECIFIC HEAT; THERMAL CONDUCTIVITY;

SILICON NITRIDE MEMBRANES; THERMAL CHARACTERIZATION; THERMAL INFRARED DETECTORS; THERMAL MASS;

MICROELECTROMECHANICAL DEVICES;

EID: 0031094212     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.557531     Document Type: Article

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