Meeting overlay requirements for future technology nodes with in-die overlay metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Schulz, Bernd ^a   Seltmann, Rolf ^a   Busch, Jens ^a   Hempel, Fritjof ^a   Cotte, Eric ^b   Alles, Benjamin ^c  

^a IBM MICROELECTRONICS   (United States)

^b AMTC GmbH and Co KG   (Germany)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

In die overlay; Mask registration; Metrology; Process control; Residuals

Indexed keywords

MASK REGISTRATION; OVERLAY ERRORS; REGISTRATION OVERLAY ERRORS; SCANNER INDUCED DISTORTIONS;

ERROR ANALYSIS; INTEGRATED CIRCUITS; PROCESS CONTROL; SCANNING;

MEASUREMENT THEORY;

EID: 35148847306     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.708471     Document Type: Conference Paper

References (11)

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