-
2
-
-
32144461415
-
-
M. Verdier, M. Veron, F. Bley, F. Ingwiller, N. M. Dempsey, and D. Givord, Philos. Mag. 85, 3157 (2005).
-
(2005)
Philos. Mag.
, vol.85
, pp. 3157
-
-
Verdier, M.1
Veron, M.2
Bley, F.3
Ingwiller, F.4
Dempsey, N.M.5
Givord, D.6
-
3
-
-
0035356750
-
-
Y. Endo, N. Kikuchi, O. Kitakami, and Y. Shimada, J. Appl. Phys. 89, 7065 (2001).
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 7065
-
-
Endo, Y.1
Kikuchi, N.2
Kitakami, O.3
Shimada, Y.4
-
4
-
-
0346961352
-
-
Y. Endo, K. Oikawa, T. Miyazaki, O. Kitakami, and Y. Shimada, J. Appl. Phys. 94, 7222 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 7222
-
-
Endo, Y.1
Oikawa, K.2
Miyazaki, T.3
Kitakami, O.4
Shimada, Y.5
-
5
-
-
3142677330
-
-
S. C. Chou, C. C. Yu, Y. Liou, and Y. D. Yao, Phys. Status Solidi A 201, 1755 (2004).
-
(2004)
Phys. Status Solidi A
, vol.201
, pp. 1755
-
-
Chou, S.C.1
Yu, C.C.2
Liou, Y.3
Yao, Y.D.4
-
6
-
-
2942672503
-
-
S. C. Chou, C. C. Yu, Y. Liou, Y. D. Yao, D. H. Wei, T. S. Chin, and M. F. Tai, J. Appl. Phys. 95, 7276 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 7276
-
-
Chou, S.C.1
Yu, C.C.2
Liou, Y.3
Yao, Y.D.4
Wei, D.H.5
Chin, T.S.6
Tai, M.F.7
-
9
-
-
42149083050
-
-
Diffusion in Solid Metals and Alloys, Landott-Bornstein, New Series, GrouIII, Vol. (Springer, Berlin).
-
H. Mehrer, Diffusion in Solid Metals and Alloys, Landott-Bornstein, New Series, Group III, Vol. 26 (Springer, Berlin, 1990).
-
(1990)
, vol.26
-
-
Mehrer, H.1
-
11
-
-
30744445456
-
-
Y. Nose, T. Ikeda, H. Nakajima, and H. Numakura, Defect Diffus. Forum 237-240, 450 (2005).
-
(2005)
Defect Diffus. Forum
, vol.237-240
, pp. 450
-
-
Nose, Y.1
Ikeda, T.2
Nakajima, H.3
Numakura, H.4
-
13
-
-
42149134599
-
-
Synthetic Modulated Structures (Academic, New York).
-
L. Chang and B. C. Giessen, Synthetic Modulated Structures (Academic, New York, 1985).
-
(1985)
-
-
Chang, L.1
Giessen, B.C.2
-
14
-
-
42149180871
-
-
Diffusion Phenomena in Thin Films and Microelectronic Materials (Noyes, Park Ridge, NJ).
-
D. Gupta and P. S. Ho, Diffusion Phenomena in Thin Films and Microelectronic Materials (Noyes, Park Ridge, NJ, 1988).
-
(1988)
-
-
Gupta, D.1
Ho, P.S.2
-
17
-
-
33750017576
-
-
N. Zotov, J. Feydt, A. Savan, and A. Ludwig, J. Appl. Phys. 100, 073517 (2006).
-
(2006)
J. Appl. Phys.
, vol.100
, pp. 073517
-
-
Zotov, N.1
Feydt, J.2
Savan, A.3
Ludwig, A.4
-
19
-
-
0042011394
-
-
D. B. Aubertine, N. Ozguveen, P. C. McIntyre, and S. Brenan, J. Appl. Phys. 94, 1557 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 1557
-
-
Aubertine, D.B.1
Ozguveen, N.2
McIntyre, P.C.3
Brenan, S.4
-
21
-
-
0018812396
-
-
R. M. Fleming, D. B. McWhan, A. C. Gossard, W. Wiegmann, and R. A. Logan, J. Appl. Phys. 51, 357 (1980).
-
(1980)
J. Appl. Phys.
, vol.51
, pp. 357
-
-
Fleming, R.M.1
McWhan, D.B.2
Gossard, A.C.3
Wiegmann, W.4
Logan, R.A.5
-
22
-
-
84983417418
-
-
O. Se-Young, D. P. Nguyen, C. G. Lee, B. S. Lee, B. H. Koo, H. Y. Liu, J. H. Yoo, and K. Shin, Diffus. Defect Data, Pt. A 258-260, 199 (2006).
-
(2006)
Diffus. Defect Data, Pt. A
, vol.258-260
, pp. 199
-
-
Se-Young, O.1
Nguyen, D.P.2
Lee, C.G.3
Lee, B.S.4
Koo, B.H.5
Liu, H.Y.6
Yoo, J.H.7
Shin, K.8
|