Size controlled deposition of Cu and Si nano-clusters by an ultra-high vacuum sputtering gas aggregation technique

Applied Physics A: Materials Science and Processing

Volumn 90, Issue 2, 2008, Pages 299-303

  Banerjee, A N ^a   Krishna, R ^a   Das, B ^a  

^a University of Nevada Las Vegas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; FLOW RATE; MAGNETRON SPUTTERING; OPTIMIZATION; SILICON;

CLUSTER-SIZE DISTRIBUTIONS; INERT GAS CONDENSATION; VACUUM SPUTTERING;

NANOCLUSTERS;

EID: 36749002054     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-4271-7     Document Type: Article

References (17)

1. R. Meyer, J.J. Gafner, S.L. Gafner, S. Stappert, B. Rellinghaus, P. Entel, Phase Trans. 78, 35 (2005)
2. W.A. de Heer, Rev. Mod. Phys. 65, 611 (1993)
3. U. Landman, W.D. Luedtke, Appl. Surf. Sci. 60/61, 1 (1992)
4. M. Kappes, S. Leutwyler, in: Molecular Beams of Clusters in Atomic and Molecular Beam Methods, ed. by G. Scoles (Oxford, New York, 1988) Vol. 1
5. C.G. Granqvist, R.A. Buhrman, J. Appl. Phys. 47, 2200 (1976)
6. T. Hihara, K. Sumiyama, J. Appl. Phys. 84, 5270 (1998)
7. K. Bromann, C. Félix, H. Brune, W. Harbich, R. Monot, J. Buttet, K. Kern, Science 274, 956 (1996)
8. S. Pratontep, S.J. Carroll, C. Xirouchaki, M. Streun, R.E. Palmer, Rev. Sci. Instrum. 76, 045103 (2005)
9. R. Morel, A. Brenac, P. Bayle-Guillemaud, C. Portemont, F. La Rizza, Eur. Phys. J. D 24, 287 (2003)
10. F.F. Abraham, Homogeneous Nucleation Theory (Academic, New York, 1974)
11. W. Knauer, J. Appl. Phys. 62, 841 (1987)
12. J.M. Soler, N. Garcia, O. Echt, K. Sattler, E. Recknagel, Phys. Rev. Lett. 49, 1857 (1982)
13. A. Hosseini-Tehrani, F.K. Urban III, J. Vac. Sci. Technol. A 17, 2364 (1999)
14. A.N. Banerjee, B. Das, Nanotechnology (in press)
15. K. Raghavachary, V. Logovinsky, Phys. Rev. Lett. 55, 2853 (1985)
16. B. Delley, D.E. Ellis, Phys. Rev. B 27, 2132 (1982)
17. O.F. Hagena, Surf. Sci. 106, 101 (1981)