Combined x-ray photoelectron spectroscopy/ultraviolet photoelectron spectroscopy/field emission spectroscopy for characterization of electron-emission mechanism of diamond

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 2, 2008, Pages 730-734

  Yamaguchi, H ^a,b   Kudo, Y ^a   Masuzawa, T ^a   Kudo, M ^c   Yamada, T ^d   Takakuwa, Y ^e   Okano, K ^a,b  

^a INTERNATIONAL CHRISTIAN UNIVERSITY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^c JEOL LTD   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^e TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ENERGY SHIFT; FES PEAK ENERGY;

DIAMONDS;

EID: 41549125897     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2837872     Document Type: Article

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