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Volumn 26, Issue 2, 2008, Pages 582-584

High-aspect-ratio nanopillar structures fabricated by nanoimprinting with elongation phenomenon

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING;

NANOIMPRINTING; NANOPILLARS; UNMOLDING TEMPERATURE;

NANOSTRUCTURES;

EID: 41549094521 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2889396 Document Type: Article

Times cited : (11)

References (11)

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